DNA+Nanowire

=Introduction= toc

DNA Nanowires are an exciting new prospect in the field of nanotechnology with a wide range of applications. Essentially, a DNA nanowire is a strands of DNA coated with a conducting substance such as silver. The DNA provides the framework and structure for the wire, allowing the metal to be attached and conduct electricity along the wire. = = =Videos=

DNA
This video from [|Khanacademy] gives an overview of what DNA is and its basic molecular structure. media type="youtube" key="_-vZ_g7K6P0" width="425" height="350"

=Web Resources=

[|How Nanowires Work]
Howstuffworks.com provides an overview of what nanowires are, different types of nanowire, methods of manufacture, applications, and more.

[|MIT spectrum: Nanoscience and Nanotechnology]

[|Science News: DNA Used To Create Self Assembling Conducting Wire]gives an account of production of the first DNA nanowire in 1998 at the Technion-Israel Institute of Technology.

=Academic Papers=

DNA-templated assembly and electrode attachment of a conducting silver wire
Technion-Israel Institute of Technology



Introduction to Self Assembling DNA Nanostructures
Duke University

DNA Nanowire Fabrication
Lousiana Tech University



Nanoscale Palladium Metallization of DNA
Advanced Materials



=News and Recent Developments=

Discovery News
An article entitled[| Nanowires Built From DNA] discusses recent developments in DNA Nanowire research using UV light.

=Method=

As described in "DNA-templated assembly and electrode attachment or a conducting silver wire" from Technion-Israel Institute of Technology

Sample/Slide Preparation:
"A glass cover slip is immersed in fuming nitric acid for 10 min, rinsed with DI water, immersed in a 1M NaOH solution for a further 10 min and rinsed again with DI water. The cleaned glass is dried thoroughly and then passivated against spurious DNA binding by immersion for 12 hours in a 1:5 v/v solution of trimethyl chlorosilane (sigma) in tetrachloroethane (Sigma). The sample is then rinsed carefully several times with tetrachloroethane and isopropanol and dried thoroughly. Electrodes, 12 or 16 micro-meters apart, are defined on the coverslip by standard [|photolithography] and subsequent high vacuum deposition of a 50 nm gold layer on top of a 10 nm titanium adhesion layer. A lift-off process then follows."

=Collaborators=

Logan Van Engelhoven